Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12292964Application Date: 2008-12-01
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Publication No.: US08279396B2Publication Date: 2012-10-02
- Inventor: Nicolaas Ten Kate , Willem Jurrianus Venema , Ronald Van Der Ham
- Applicant: Nicolaas Ten Kate , Willem Jurrianus Venema , Ronald Van Der Ham
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32

Abstract:
An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface.
Public/Granted literature
- US20100231875A2 Lithographic Apparatus and Device Manufacturing Method Public/Granted day:2010-09-16
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