Invention Grant
US08279402B2 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same 有权
用于具有疏水性涂层的浸没式光刻的光学布置,以及包括其的投影曝光设备

Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same
Abstract:
An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
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