Invention Grant
US08279402B2 Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same
有权
用于具有疏水性涂层的浸没式光刻的光学布置,以及包括其的投影曝光设备
- Patent Title: Optical arrangement for immersion lithography with a hydrophobic coating, as well as projection exposure apparatus comprising the same
- Patent Title (中): 用于具有疏水性涂层的浸没式光刻的光学布置,以及包括其的投影曝光设备
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Application No.: US12403132Application Date: 2009-03-12
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Publication No.: US08279402B2Publication Date: 2012-10-02
- Inventor: Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
- Applicant: Stephan Six , Michael Lill , Ruediger Duesing , Bernhard Gellrich , Michael Widmann , Andreas Schubert , Tilmann Von Papen , Thomas Ihl
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Priority: DE102006043548 20060912; DE102006062480 20061228
- Main IPC: G03F7/207
- IPC: G03F7/207

Abstract:
An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.
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