Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12709151Application Date: 2010-02-19
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Publication No.: US08279405B2Publication Date: 2012-10-02
- Inventor: Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- Applicant: Marcel Mathijs Theodore Marie Dierichs , Hans Van Der Laan , Hendrikus Robertus Marie Van Greevenbroek
- Applicant Address: NL Vedlhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Vedlhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP02251933 20020318
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/42
Abstract:
A lithographic apparatus includes a radiation system having reflective optical elements constructed and arranged to condition a beam of radiation. The reflective optical elements include a first faceted mirror constructed and arranged to generate a plurality of source images on a second mirror. The lithographic apparatus also includes a facet mask constructed and arranged to selectively mask one or more of the facets of the first faceted mirror. The facet mask includes a masking blade selectively interposable into the beam.
Public/Granted literature
- US20100141918A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-06-10
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