Invention Grant
US08279407B2 Stage system and lithographic apparatus comprising such stage system
有权
包括这种舞台系统的舞台系统和光刻设备
- Patent Title: Stage system and lithographic apparatus comprising such stage system
- Patent Title (中): 包括这种舞台系统的舞台系统和光刻设备
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Application No.: US12408936Application Date: 2009-03-23
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Publication No.: US08279407B2Publication Date: 2012-10-02
- Inventor: Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
- Applicant: Ramidin Izair Kamidi , Henrikus Herman Marie Cox , Emiel Jozef Melanie Eussen , Ronald Casper Kunst , Engelbertus Antonius Fransiscus Van Der Pasch , Marcel François Heertjes , Mark Constant Johannes Baggen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42
Abstract:
A stage system includes a movable stage, at least two encoder heads each constructed to provide an encoder signal representative of a position of the movable stage with respect to an encoder target structure, and a controller to control a position of the stage. The controller is provided with the encoder signals of each of the encoder heads. The controller is arranged to apply a weighting function to the encoder signals and to derive a position of the stage from the weighted encoder signals.
Public/Granted literature
- US20090279067A1 Stage System and Lithographic Apparatus Comprising Such Stage System Public/Granted day:2009-11-12
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