Invention Grant
- Patent Title: Object support positioning device and lithographic apparatus
- Patent Title (中): 对象支持定位装置和光刻设备
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Application No.: US12484764Application Date: 2009-06-15
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Publication No.: US08279408B2Publication Date: 2012-10-02
- Inventor: Edwin Johan Buis
- Applicant: Edwin Johan Buis
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; H02K41/02 ; F16C32/06

Abstract:
An object support positioning device configured to position an object support includes first and second side-beams having respective first and second sliders mounted thereon, first and second motors configured to move the first and second sliders along each respective side beam, a cross beam mounted proximate first and second ends thereof to the first and second sliders respectively and having a third slider mounted thereto, the cross-beam and the first and second slider being mounted together, and a third motor configured to move the third slider longitudinally along the cross-beam, the third slider being adapted to support the one object support. A fluid bearing is provided in at least one of the first, second and third sliders, the fluid bearing including multiple bearing surfaces to exert reaction forces in a first direction, the first direction being perpendicular to the sliding direction of the at least one slider.
Public/Granted literature
- US20090323038A1 OBJECT SUPPORT POSITIONING DEVICE AND LITHOGRAPHIC APPARATUS Public/Granted day:2009-12-31
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