Invention Grant
US08279431B2 Spectral detection method and device, and defect inspection method and apparatus using the same
有权
光谱检测方法和装置,以及使用其的缺陷检查方法和装置
- Patent Title: Spectral detection method and device, and defect inspection method and apparatus using the same
- Patent Title (中): 光谱检测方法和装置,以及使用其的缺陷检查方法和装置
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Application No.: US12626963Application Date: 2009-11-30
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Publication No.: US08279431B2Publication Date: 2012-10-02
- Inventor: Takenori Hirose , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
- Applicant: Takenori Hirose , Minoru Yoshida , Hideaki Sasazawa , Yasuhiro Yoshitake
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2009-007160 20090116
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
In spectral detection for detecting the shape of repeating pattern structures uniformly formed on a surface of a test object, it is advantageous to use light having a wide wavelength range in a short wavelength region. However, it is not easy to realize a relatively simple optical system capable of spectral detection of light having a wide wavelength range in a short wavelength region, namely in ultraviolet region. The present invention provides an inspection apparatus for detecting pattern defects. The inspection apparatus includes a spectral detection optical system capable of spectral detection of light in a wavelength range from deep ultraviolet to near infrared. The spectral detection optical system includes a spatially partial mirror serving as a half mirror and a reflecting objective provided with an aperture stop for limiting the angle and direction of light to be applied to and reflected by a test object.
Public/Granted literature
- US20100182589A1 SPECTRAL DETECTION METHOD AND DEVICE, AND DEFECT INSPECTION METHOD AND APPARATUS USING THE SAME Public/Granted day:2010-07-22
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