Invention Grant
- Patent Title: Electrostatic chuck
- Patent Title (中): 静电吸盘
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Application No.: US12753992Application Date: 2010-04-05
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Publication No.: US08279576B2Publication Date: 2012-10-02
- Inventor: Keiichi Nakamura , Shunsuke Tanaka
- Applicant: Keiichi Nakamura , Shunsuke Tanaka
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01T23/00 ; B32B9/00 ; C04B35/00 ; B23B31/28
Abstract:
A ceramic electrostatic chuck according to the present invention includes a dielectric layer with a support layer in contact with the back side of the dielectric layer, and an embedded electrostatic electrode. A wafer is placed on the dielectric layer and the dielectric layer is formed of sintered aluminum nitride containing Sm and has a volume resistivity in the range of 4×109 to 4×1010 Ωcm at room temperature. The support layer is formed of sintered aluminum nitride containing Sm and Ce and has a volume resistivity of 1×1013 Ωcm or more at room temperature.
Public/Granted literature
- US20100254065A1 ELECTROSTATIC CHUCK Public/Granted day:2010-10-07
Information query
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