Invention Grant
US08280632B2 Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus
有权
用于检查重叠图形的装置和方法,以及带电粒子束写入装置
- Patent Title: Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus
- Patent Title (中): 用于检查重叠图形的装置和方法,以及带电粒子束写入装置
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Application No.: US12392507Application Date: 2009-02-25
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Publication No.: US08280632B2Publication Date: 2012-10-02
- Inventor: Shinji Sakamoto , Shigehiro Hara , Hitoshi Higurashi
- Applicant: Shinji Sakamoto , Shigehiro Hara , Hitoshi Higurashi
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-045860 20080227
- Main IPC: G06F19/00
- IPC: G06F19/00 ; G06F17/50 ; G21G5/00

Abstract:
An apparatus for inspecting overlapping figures includes a chip overlap inspection unit configured to input a data file on each chip of a plurality of chips arranged in a writing pattern, and inspect an existence of an overlap between a plurality of chips, based on arrangement data on each region of the plurality of chips, a setting unit configured to set, with respect to the plurality of chips, a plurality of hierarchies and a plurality of cell regions of each of the plurality of hierarchies, an extraction unit configured to extract, with respect to a plurality of chips where the overlap occurs, a cell region where the overlap is located, from a higher hierarchy level to a lower hierarchy level in order, a figure overlap judging unit configured to judge an existence of an overlap between a figure in the cell region extracted and a figure in the other cell region extracted, and an output unit configured to output data on a plurality of figures overlapping.
Public/Granted literature
- US20090216450A1 APPARATUS AND METHOD FOR INSPECTING OVERLAPPING FIGURE, AND CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2009-08-27
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