Invention Grant
- Patent Title: Method for locating the appearance of a defect in a medium using a wave
- Patent Title (中): 使用波形定位介质中缺陷外观的方法
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Application No.: US12697934Application Date: 2010-02-01
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Publication No.: US08280648B2Publication Date: 2012-10-02
- Inventor: Eric Francois Larose , Vincent Bruno Robert Rossetto-Giaccherino
- Applicant: Eric Francois Larose , Vincent Bruno Robert Rossetto-Giaccherino
- Applicant Address: FR Paris Cedex
- Assignee: Centre National de la Recherche Scientifique—CNRS
- Current Assignee: Centre National de la Recherche Scientifique—CNRS
- Current Assignee Address: FR Paris Cedex
- Agency: Miller, Matthias & Hull LLP
- Main IPC: G01B5/02
- IPC: G01B5/02

Abstract:
A medium is equipped with sources adapted for emitting a wave and sensors adapted for receiving the wave emitted. The method for locating an appearance of a defect in the medium comprises an initialization step in which reference impulse responses of the wave between the sources and sensors are determined, then at least one defect detection step in which the impulse responses of the wave between the sources and the sensors are measured, a decorrelation coefficient between the impulse responses and the reference impulse responses is calculated, a probability of exploration of a position is calculated, an error function for each source-sensor pair is calculated, and a product of at least some of the error functions of the source-sensor pairs is calculated. The product represents a map of a probability of the appearance of the defect at each position in the medium.
Public/Granted literature
- US20100256928A1 Method for Locating the Appearance of a Defect in a Medium Using a Wave Public/Granted day:2010-10-07
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