Invention Grant
US08280852B2 System, method and storage medium for controlling a processing system
有权
用于控制处理系统的系统,方法和存储介质
- Patent Title: System, method and storage medium for controlling a processing system
- Patent Title (中): 用于控制处理系统的系统,方法和存储介质
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Application No.: US12205161Application Date: 2008-09-05
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Publication No.: US08280852B2Publication Date: 2012-10-02
- Inventor: Hiroshi Nakamura , Shouichi Otake , Wataru Nakagomi
- Applicant: Hiroshi Nakamura , Shouichi Otake , Wataru Nakagomi
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-239975 20070914
- Main IPC: G06F7/00
- IPC: G06F7/00 ; G06F17/00

Abstract:
A processing system 10 applies an etching process on a wafer W in a PM1 or PM2. An EC 200 includes functions of a transfer/process control unit 250, a communication unit 255, a log management unit 260, and a backup unit 265, and controls the processing system 10. The transfer/process control unit 250 controls wafer transfer and the etching process. The communication unit 255 transmits to or receives data from each MC 300 and the like. The log management unit 260 registers log information generated at times of the wafer process and transfer, data communication, and the like in log files (in predetermined storage areas of an HDD 215). The backup unit 265 collectively saves the log information stored in the log files in backup files (in other storage areas of the HDD 215), in response to a timing when an unexpected alarm has been generated.
Public/Granted literature
- US20090076640A1 SYSTEM, METHOD AND STORAGE MEDIUM FOR CONTROLLING A PROCESSING SYSTEM Public/Granted day:2009-03-19
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