Invention Grant
US08281262B2 Partitioning features of a single IC layer onto multiple photolithographic masks 有权
将单个IC层分成多个光刻掩模的特征

  • Patent Title: Partitioning features of a single IC layer onto multiple photolithographic masks
  • Patent Title (中): 将单个IC层分成多个光刻掩模的特征
  • Application No.: US12630330
    Application Date: 2009-12-03
  • Publication No.: US08281262B2
    Publication Date: 2012-10-02
  • Inventor: Thomas J. Aton
  • Applicant: Thomas J. Aton
  • Applicant Address: US TX Dallas
  • Assignee: Texas Instruments Incorporated
  • Current Assignee: Texas Instruments Incorporated
  • Current Assignee Address: US TX Dallas
  • Agent Warren L. Franz; Wade J. Brady, III; Frederick J. Telecky, Jr.
  • Main IPC: G06F17/50
  • IPC: G06F17/50
Partitioning features of a single IC layer onto multiple photolithographic masks
Abstract:
One embodiment relates to a computer method of providing an electronic mask set for an integrated circuit (IC) layer. In the method, a first electronic mask is generated for the IC layer. The first electronic mask includes a first series of longitudinal segments from the IC layer, where the first series has fewer than all of the longitudinal segments in the IC layer. A second electronic mask is also generated for the IC layer. The second electronic mask includes a second series of longitudinal segments from the IC layer, where the second series has fewer than all of the longitudinal segments in the IC layer and differs from the first series. The first and second masks are generated so a coupling segment extends traverse to the first direction and couples one longitudinal segment on the IC layer to another longitudinal segment on the IC layer.
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