Invention Grant
- Patent Title: Etch apparatus and method of etching silicon nitride
- Patent Title (中): 蚀刻装置和蚀刻氮化硅的方法
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Application No.: US12274072Application Date: 2008-11-19
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Publication No.: US08282766B2Publication Date: 2012-10-09
- Inventor: Gerhard Eilmsteiner , Johann Ninaus
- Applicant: Gerhard Eilmsteiner , Johann Ninaus
- Applicant Address: AT Unterpremstätten
- Assignee: Austriamicrosystems AG
- Current Assignee: Austriamicrosystems AG
- Current Assignee Address: AT Unterpremstätten
- Agent Cozen O'Connor
- Main IPC: H01L21/306
- IPC: H01L21/306

Abstract:
An etch apparatus, especially for silicon nitride etch includes a control unit coupled to at least one component of the group of components comprising heater current sensors, a pump transducer sensor and a flow sensor provided for a diluting liquid. A malfunction of the apparatus is avoided and the etching process can be controlled for better performance.
Public/Granted literature
- US20100124824A1 Etch Apparatus and Method of Etching Silicon Nitride Public/Granted day:2010-05-20
Information query
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