Invention Grant
- Patent Title: Processing condition inspection and optimization method of damage recovery process, damage recovering system and storage medium
- Patent Title (中): 损坏恢复过程的处理条件检查和优化方法,损坏恢复系统和存储介质
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Application No.: US12326507Application Date: 2008-12-02
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Publication No.: US08282984B2Publication Date: 2012-10-09
- Inventor: Reiko Sasahara , Jun Tamura , Shigeru Tahara
- Applicant: Reiko Sasahara , Jun Tamura , Shigeru Tahara
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-312562 20071203; JP2008-147701 20080605
- Main IPC: C23C14/54
- IPC: C23C14/54

Abstract:
A processing condition inspection method of a damage recovery process for reforming a film having OH groups generated by damages from a predetermined process by using a processing gas includes preparing a substrate having an OH group containing resin film, measuring an initial film thickness of the OH group containing resin film, performing a damage recovery process on the substrate after measuring the initial film thickness, measuring a film thickness of the OH group containing resin film after the damage recovery process, calculating a film thickness difference of the OH group containing resin film before and after the damage recovery process, and determining whether processing conditions of the damage recovery process are appropriate or inappropriate based on the film thickness difference.
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Information query
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