Invention Grant
US08282997B2 Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating
有权
用于制备疏水涂层的方法,用于实施所述方法的装置和具有疏水涂层的支撑体
- Patent Title: Method for producing a hydrophobic coating, device for implementing said method and support provided with a hydrophobic coating
- Patent Title (中): 用于制备疏水涂层的方法,用于实施所述方法的装置和具有疏水涂层的支撑体
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Application No.: US11597658Application Date: 2005-05-26
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Publication No.: US08282997B2Publication Date: 2012-10-09
- Inventor: Alfred Hofrichter , Herve Montigaud , Jean-Christophe Giron
- Applicant: Alfred Hofrichter , Herve Montigaud , Jean-Christophe Giron
- Applicant Address: FR Courbevoie
- Assignee: Saint Gobain Glass France
- Current Assignee: Saint Gobain Glass France
- Current Assignee Address: FR Courbevoie
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102004026344 20040526
- International Application: PCT/FR2005/050368 WO 20050526
- International Announcement: WO2005/118501 WO 20051215
- Main IPC: C23C14/02
- IPC: C23C14/02 ; H05H1/00 ; C04B41/00

Abstract:
The invention concerns a method for producing a coating on a support, in particular a glass support, wherein a thin-film metal oxide is deposited on the support, said thin film being subjected to an etching process to roughen its surface, a second coating capable of adhering to the first metal oxide film is then applied on the roughened surface. The invention is characterized in that it consists in depositing a first doped metal oxide or metal oxynitride doped with at least a second metal oxide or metal oxynitride, the second metal oxide or metal oxynitride being distributed in the deposited film. During the etching process, a plasma-activated gas is used which removes at least a second metal oxide or metal oxynitride less than the first metal oxide or metal oxynitride so as to form, after the etching process, on the surface raised irregularities consisting of at least a second metal oxide or metal oxynitride.
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