Invention Grant
US08283105B2 Positive resist composition and method of forming resist pattern
有权
正型抗蚀剂组合物和形成抗蚀剂图案的方法
- Patent Title: Positive resist composition and method of forming resist pattern
- Patent Title (中): 正型抗蚀剂组合物和形成抗蚀剂图案的方法
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Application No.: US12717870Application Date: 2010-03-04
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Publication No.: US08283105B2Publication Date: 2012-10-09
- Inventor: Yasuhiko Kakinoya , Naoto Motoike
- Applicant: Yasuhiko Kakinoya , Naoto Motoike
- Applicant Address: JP Kawasaki-shi
- Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee: Tokyo Ohka Kogyo Co., Ltd.
- Current Assignee Address: JP Kawasaki-shi
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: JP2009-058738 20090311
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039 ; G03F7/26

Abstract:
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the component (A) including a polymeric compound (A1) having an acid dissociable, dissolution inhibiting group in the structure thereof and including a structural unit (a0) having an —SO2— containing cyclic group on the terminal of the side chain, and the component (B) including an acid generator (B1) containing a compound represented by general formula (b1-1) (R0 represents a hydrocarbon group of 1 to 12 carbon atoms which may have a substituent, provided that the carbon atom adjacent to the sulfur atom within the —SO3− group has no fluorine atom bonded thereto, and Z+ represents an organic cation). R0—SO3−Z+ (b1-1)
Public/Granted literature
- US20100233624A1 POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN Public/Granted day:2010-09-16
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