Invention Grant
- Patent Title: Method of making ultrahigh density vertical NAND memory device
- Patent Title (中): 制造超高密度垂直NAND存储器件的方法
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Application No.: US13467245Application Date: 2012-05-09
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Publication No.: US08283228B2Publication Date: 2012-10-09
- Inventor: Johann Alsmeier
- Applicant: Johann Alsmeier
- Applicant Address: US TX Plano
- Assignee: SanDisk Technologies Inc.
- Current Assignee: SanDisk Technologies Inc.
- Current Assignee Address: US TX Plano
- Agency: The Marbury Law Group PLLC
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
Monolithic, three dimensional NAND strings include a semiconductor channel, at least one end portion of the semiconductor channel extending substantially perpendicular to a major surface of a substrate, a plurality of control gate electrodes having a strip shape extending substantially parallel to the major surface of the substrate, the blocking dielectric comprising a plurality of blocking dielectric segments, a plurality of discrete charge storage segments, and a tunnel dielectric located between each one of the plurality of the discrete charge storage segments and the semiconductor channel.
Public/Granted literature
- US20120220088A1 ULTRAHIGH DENSITY VERTICAL NAND MEMORY DEVICE AND METHOD OF MAKING THEREOF Public/Granted day:2012-08-30
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