Invention Grant
US08284012B2 Ultra-stable refractory high-power thin film resistors for space applications
有权
用于空间应用的超稳定耐火大功率薄膜电阻器
- Patent Title: Ultra-stable refractory high-power thin film resistors for space applications
- Patent Title (中): 用于空间应用的超稳定耐火大功率薄膜电阻器
-
Application No.: US12478376Application Date: 2009-06-04
-
Publication No.: US08284012B2Publication Date: 2012-10-09
- Inventor: Robert C. Cole , Gouri Radhakrishnan
- Applicant: Robert C. Cole , Gouri Radhakrishnan
- Applicant Address: US CA El Segundo
- Assignee: The Aerospace Corporation
- Current Assignee: The Aerospace Corporation
- Current Assignee Address: US CA El Segundo
- Agency: Henricks, Slavin & Holmes LLP
- Main IPC: H01C7/10
- IPC: H01C7/10
Abstract:
A method of fabricating a thin film resistor including providing a substrate, using a low-temperature pulsed-laser deposition process to deposit a titanium carbide (TiC) layer on the substrate, removing portions of the TiC layer with an etching process to leave a TiC pattern on the substrate, and depositing conductive material on opposite ends of the TiC pattern to provide a thin film resistor.
Public/Granted literature
- US20100308955A1 Ultra-Stable Refractory High-Power Thin Film Resistors for Space Applications Public/Granted day:2010-12-09
Information query
