Invention Grant
- Patent Title: Tunneling junction magnetoresistive effect element and manufacturing method thereof
- Patent Title (中): 隧道结磁阻效应元件及其制造方法
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Application No.: US12955746Application Date: 2010-11-29
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Publication No.: US08284526B2Publication Date: 2012-10-09
- Inventor: Koichi Nishioka , Koji Sakamoto , Tatsumi Hirano
- Applicant: Koichi Nishioka , Koji Sakamoto , Tatsumi Hirano
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Priority: JP2009-280551 20091210
- Main IPC: G11B5/33
- IPC: G11B5/33

Abstract:
According to one embodiment, a TMR effect element includes a ground layer, an antiferromagnetic layer above the ground layer, a first ferromagnetic layer above the antiferromagnetic layer and exchange-coupled to the antiferromagnetic layer, an anti-parallel coupling layer above the first ferromagnetic layer, a second ferromagnetic layer having a magnetic moment coupled anti-parallel to the magnetic moment of the first ferromagnetic layer via the anti-parallel coupling layer, an insulation barrier layer above the second ferromagnetic layer, and a third ferromagnetic layer above the insulation barrier layer. At least a portion of the second ferromagnetic layer and at least a portion of the third ferromagnetic layer on an insulation barrier layer side are comprised of a crystal, and the insulation barrier layer comprises MgO and an oxide material having an independent cubic crystal structure and complete solid solubility with MgO. Other elements, heads, and formation methods are described according to various embodiments.
Public/Granted literature
- US20110141606A1 TUNNELING JUNCTION MAGNETORESISTIVE EFFECT ELEMENT AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-06-16
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