Invention Grant
- Patent Title: Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
- Patent Title (中): 用于在其上形成外延薄膜的带纹理金属基底及其制造方法
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Application No.: US12101385Application Date: 2008-04-11
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Publication No.: US08287643B2Publication Date: 2012-10-16
- Inventor: Naoji Kashima , Shigeo Nagaya , Kunihiro Shima , Hirofumi Hoshino
- Applicant: Naoji Kashima , Shigeo Nagaya , Kunihiro Shima , Hirofumi Hoshino
- Applicant Address: JP Aichi JP Tokyo
- Assignee: Chubu Electric Power Co., Inc.,Tanaka Kikinzoku Kogyo K.K.
- Current Assignee: Chubu Electric Power Co., Inc.,Tanaka Kikinzoku Kogyo K.K.
- Current Assignee Address: JP Aichi JP Tokyo
- Agency: Roberts & Roberts, LLP
- Priority: JPP2007-108607 20070417
- Main IPC: C30B33/06
- IPC: C30B33/06 ; C30B1/00 ; C30B3/00 ; C30B5/00 ; C30B28/02

Abstract:
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100} cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process.
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