Invention Grant
US08287643B2 Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same 有权
用于在其上形成外延薄膜的带纹理金属基底及其制造方法

Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
Abstract:
The present invention provides an oriented substrate for forming an epitaxial thin film thereon, which has a more excellent orientation than that of a conventional one and a high strength, and a method for manufacturing the same. The present invention provides a clad textured metal substrate for forming the epitaxial thin film thereon, which includes a metallic layer and a silver layer bonded to at least one face of the metallic layer, wherein the silver layer has a {100} cube texture in which a deviating angle Δφ of crystal axes satisfies Δφ≦9 degree. The textured metal substrate can be manufactured by subjecting the silver sheet containing 30 to 200 ppm oxygen by concentration to the orienting treatment of hot-working and heat-treating, and bonding the metal sheet with the oriented silver sheet by using a surface activated bonding process.
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