Invention Grant
- Patent Title: Electrical interconnect structure and process thereof and circuit board structure
- Patent Title (中): 电气互连结构及其工艺及电路板结构
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Application No.: US12345364Application Date: 2008-12-29
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Publication No.: US08288663B2Publication Date: 2012-10-16
- Inventor: Tsung-Yuan Chen , Shu-Sheng Chiang , David C. H. Cheng
- Applicant: Tsung-Yuan Chen , Shu-Sheng Chiang , David C. H. Cheng
- Applicant Address: TW Taoyuan
- Assignee: Unimicron Technology Corp.
- Current Assignee: Unimicron Technology Corp.
- Current Assignee Address: TW Taoyuan
- Agency: J.C. Patents
- Priority: TW97117559A 20080513
- Main IPC: H01K1/11
- IPC: H01K1/11

Abstract:
An electrical interconnecting structure suitable for a circuit board is provided. The electrical interconnecting structure includes a core, an ultra fine pattern, and a patterned conductive layer. The core has a surface, and the ultra fine pattern is inlaid in the surface of the core. The patterned conductive layer is disposed on the surface of the core and is partially connected to the ultra fine pattern. Since the ultra fine pattern of the electrical interconnecting structure is inlaid in the surface of the core and is partially connected to the patterned conductive layer located on the surface of the core.
Public/Granted literature
- US20090282674A1 ELECTRICAL INTERCONNECT STRUCTURE AND PROCESS THEREOF AND CIRCUIT BOARD STRUCTURE Public/Granted day:2009-11-19
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