Invention Grant
- Patent Title: Calibration standards and methods of their fabrication and use
- Patent Title (中): 校准标准及其制作和使用方法
-
Application No.: US12710497Application Date: 2010-02-23
-
Publication No.: US08290736B2Publication Date: 2012-10-16
- Inventor: Jinbang Tang
- Applicant: Jinbang Tang
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agent Sherry W. Schumm
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
An embodiment of a calibration standard includes a substrate, a set of conductive structures fabricated on the substrate, and a conductive end structure fabricated on the substrate. The set of conductive structures include an inner conductive structure, a first outer conductive structure positioned to one side of the inner conductive structure, and a second outer conductive structure positioned to an opposite side of the inner conductive structure. The inner and outer conductive structures are aligned in parallel with each other along offset principal axes of the inner and outer conductive structures. The conductive end structure is electrically connected between an end of the first outer conductive structure and an end of the second outer conductive structure, and the conductive end structure is spatially separated from an end of the inner conductive structure at the surface of the substrate.
Public/Granted literature
- US20110208467A1 CALIBRATION STANDARDS AND METHODS OF THEIR FABRICATION AND USE Public/Granted day:2011-08-25
Information query