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US08291351B2 Intelligent pattern signature based on lithography effects 有权
基于光刻效应的智能图案签名

Intelligent pattern signature based on lithography effects
Abstract:
The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
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