Invention Grant
- Patent Title: Intelligent pattern signature based on lithography effects
- Patent Title (中): 基于光刻效应的智能图案签名
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Application No.: US13151208Application Date: 2011-06-01
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Publication No.: US08291351B2Publication Date: 2012-10-16
- Inventor: Junjiang Lei , Kuang-Hao Lay , Srini Doddi , Weiping Fang
- Applicant: Junjiang Lei , Kuang-Hao Lay , Srini Doddi , Weiping Fang
- Applicant Address: US CA San Jose
- Assignee: Cadence Design Systems, Inc.
- Current Assignee: Cadence Design Systems, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Vista IP Law Group, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The present invention is directed to an improved method, system, and computer program product for accessing and analyzing patterns in the integrated circuit design. The method, system or computer program product includes generating an intelligent signature for a pattern. The derived pattern signature is an intelligent pattern identifier because it retains only essential information about a pattern that corresponds to lithography printable portions of the pattern. Accordingly, one pattern signature can represent a group of design patterns that are equivalents from a lithography perspective.
Public/Granted literature
- US20110239168A1 INTELLIGENT PATTERN SIGNATURE BASED ON LITHOGRAPHY EFFECTS Public/Granted day:2011-09-29
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