Invention Grant
- Patent Title: Surface shape measurement apparatus and method
- Patent Title (中): 表面形状测量装置及方法
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Application No.: US12864760Application Date: 2009-09-29
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Publication No.: US08294903B2Publication Date: 2012-10-23
- Inventor: Hirotoshi Oikaze , Takashi Urashima
- Applicant: Hirotoshi Oikaze , Takashi Urashima
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2008-252313 20080930
- International Application: PCT/JP2009/004970 WO 20090929
- International Announcement: WO2010/038418 WO 20100408
- Main IPC: G01B11/02
- IPC: G01B11/02

Abstract:
The measurement accuracy of an apparatus for measuring the surface shape of an object utilizing a two-wavelength phase-shift interferometry is improved. A low-coherence light source, a plurality of wavelength filters with different transmission wavelengths, an angle control unit and an analysis unit are provided. When performing a two-wavelength phase shift method, the analysis unit detects the wavelength difference between two wavelengths, and corrects a calculated wavelength value and a calculated phase value of one of the wavelengths for preventing a fringe-order calculation error. Next, the angle of the wavelength filters is controlled for making the actual wavelength difference coincident with a designed value. Thus, the wavelength difference between the two wavelengths is continuously controlled to be constant, which enables measurements of surface shapes with high accuracy, even when there are wavelength fluctuations due to the temperature change or the time elapse.
Public/Granted literature
- US20100309482A1 SURFACE SHAPE MEASUREMENT APPARATUS AND METHOD Public/Granted day:2010-12-09
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