Invention Grant
- Patent Title: Interconnection element for electric circuits
- Patent Title (中): 电路互连元件
-
Application No.: US12317707Application Date: 2008-12-23
-
Publication No.: US08299368B2Publication Date: 2012-10-30
- Inventor: Kimitaka Endo
- Applicant: Kimitaka Endo
- Applicant Address: US CA San Jose
- Assignee: Invensas Corporation
- Current Assignee: Invensas Corporation
- Current Assignee Address: US CA San Jose
- Agency: Lerner, David, Littenberg, Krumholz & Mentlik, LLP
- Priority: JP2007-332727 20071225
- Main IPC: H05K1/11
- IPC: H05K1/11

Abstract:
An interconnection element and method for making same is disclosed. The interconnection element may include a plurality of metal conductors, a plurality of solid metal bumps and a low melting point (LMP) metal layer. The solid metal bumps overly and project in a first direction away from respective ones of the conductors. Each bump has at least one edge bounding the bump in at least a second direction transverse to the first direction. The low melting point (LMP) metal layer has a first face joined to the respective ones of the conductors and bounded in the second direction by at least one edge and a second face joined to the bumps. The edges of the bumps and the LMP layer are aligned in the first direction, and the LMP metal layer has a melting temperature substantially lower than the conductors.
Public/Granted literature
- US20090188706A1 Interconnection element for electric circuits Public/Granted day:2009-07-30
Information query