Invention Grant
- Patent Title: Apparatus and method for cleaning substrates/media disks
- Patent Title (中): 用于清洁基板/介质盘的装置和方法
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Application No.: US12596761Application Date: 2008-04-18
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Publication No.: US08302242B2Publication Date: 2012-11-06
- Inventor: Kae Jeng Ng , Kien Hui Liang , Kien Yew Liang
- Applicant: Kae Jeng Ng , Kien Hui Liang , Kien Yew Liang
- Applicant Address: MY Selangor Darul Ehsan
- Assignee: Invenpro (M) SDN. BHD.
- Current Assignee: Invenpro (M) SDN. BHD.
- Current Assignee Address: MY Selangor Darul Ehsan
- Agency: Sughrue Mion, PLLC
- Priority: MYPI200700615 20070420
- International Application: PCT/MY2008/000033 WO 20080418
- International Announcement: WO2008/130215 WO 20081030
- Main IPC: B08B11/02
- IPC: B08B11/02

Abstract:
An apparatus and method for cleaning workpieces (5) using two pairs of substantially vertical rotating roller brushes (15) at each brush station whereby rotation of said brushes (15) propel workpieces (5) from one brush station to the next. Workpieces (5) are held for a predetermined period of time at each station by edgewheels (30, 31) which also rotate the workpieces (5). Cleaning fluid is sprayed onto workpieces (5) as they rotate to assist in removing particulate contamination. Method involves inserting a single workpiece (5) in between two pairs of rotating roller brushes (15) which scrub said workpiece as it is rotated by a pair of edgewheels (30, 31). There may be a divider shield (9) in between each brush station to prevent a large proportion of particulate matter and used cleaning fluid from traveling between the brush stations.
Public/Granted literature
- US20100083984A1 APPARATUS AND METHOD FOR CLEANING SUBSTRATES/MEDIA DISKS Public/Granted day:2010-04-08
Information query
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