Invention Grant
- Patent Title: Method for making micro-electro-mechanical system device
- Patent Title (中): 制造微机电系统装置的方法
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Application No.: US12270804Application Date: 2008-11-13
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Publication No.: US08303827B2Publication Date: 2012-11-06
- Inventor: Chuan Wei Wang , Sheng Ta Lee
- Applicant: Chuan Wei Wang , Sheng Ta Lee
- Applicant Address: TW Hsin-Chu
- Assignee: Pixart Imaging Incorporation
- Current Assignee: Pixart Imaging Incorporation
- Current Assignee Address: TW Hsin-Chu
- Agency: Tung & Associates
- Main IPC: C23F1/00
- IPC: C23F1/00
Abstract:
The present invention discloses a method for making a MEMS device, comprising: providing a zero-layer substrate; forming a MEMS device region on the substrate, wherein the MEMS device region is provided with a first sacrificial region to separate a suspension structure of the MEMS device from another part of the MEMS device; removing the first sacrificial region by etching; and micromachining the zero-layer substrate.
Public/Granted literature
- US20100120257A1 METHOD FOR MAKING MICRO-ELECTRO-MECHANICAL SYSTEM DEVICE Public/Granted day:2010-05-13
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