Invention Grant
- Patent Title: Laminated structure for marking and method of forming a mark
- Patent Title (中): 标记的层压结构和形成标记的方法
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Application No.: US12737033Application Date: 2009-07-14
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Publication No.: US08304059B2Publication Date: 2012-11-06
- Inventor: Kanji Nishimaki , Katsumi Shigeta , Yoshiji Aikyo
- Applicant: Kanji Nishimaki , Katsumi Shigeta , Yoshiji Aikyo
- Applicant Address: JP Tokyo
- Assignee: NSK Echo Mark Co., Ltd.
- Current Assignee: NSK Echo Mark Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz Holtz Goodman & Chick PC
- Priority: JP2008-192873 20080725
- International Application: PCT/JP2009/062740 WO 20090714
- International Announcement: WO2010/010829 WO 20100128
- Main IPC: B32B3/00
- IPC: B32B3/00 ; B32B5/00 ; B32B7/00 ; B32B9/00 ; B32B33/00 ; B41M5/00 ; B44C1/17 ; G03G7/00

Abstract:
A stretchable fabric for marking, having a laminated structure of a first adhesive layer 11 formed of a hot-melt adhesive composed of a thermoplastic polyurethane resin having physical properties including a melting point of 125 to 165° C., a melt viscosity of 8,000 to 15,000 Pa·s at 150° C., and a 100% modulus of 2 to 8 MPa, an interlayer 20 formed of a thermosetting polyurethane resin which is stretchable and opaque, a second adhesive layer 12 formed of the hot-melt adhesive composed of the thermoplastic polyurethane resin having the above-described physical properties, and a surface layer 30 formed of a thermosetting polyurethane resin which is stretchable and transparent, wherein a mark image has been formed on a front surface of the interlayer 20 or on a back surface of the surface layer 30. This fabric for marking is good in adhesion to an adherend and adhesion durability, can sufficiently stretch while conforming to the stretch of the adherend and can form a mark having excellent resistance to color fading.
Public/Granted literature
- US20110070409A1 FABRIC FOR MARKING AND METHOD OF FORMING MARK WITH THE SAME Public/Granted day:2011-03-24
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