Invention Grant
- Patent Title: Alkali-developable resins, method for preparing the same and photosensitive composition comprising the alkali-developable resins
- Patent Title (中): 碱显影树脂，其制备方法和包含碱显影树脂的光敏组合物
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Application No.: US12449450Application Date: 2008-02-11
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Publication No.: US08304169B2Publication Date: 2012-11-06
- Inventor: Min-Young Lim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim
- Applicant: Min-Young Lim , Han-Soo Kim , Yoon-Hee Heo , Ji-Heum Yoo , Sung-Hyun Kim
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2007-0013145 20070208
- International Application: PCT/KR2008/000790 WO 20080211
- International Announcement: WO2008/097065 WO 20080814
- Main IPC: G03F7/032
- IPC: G03F7/032 ; G03F7/028 ; G03F7/027
Abstract:
The present invention relates to a novel alkali-developable resin, a method of producing the alkali-developable resin, a photosensitive resin composition including the alkali-developable resin, and a device that is manufactured by using the photosensitive composition. In the case of when the alkali-developable resin is used as a component of the photosensitive composition, the photosensitivity, the developability and the film remaining rate of the pattern are improved.
Public/Granted literature
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