Invention Grant
- Patent Title: Photomasks, methods of exposing a substrate to light, methods of forming a pattern, and methods of manufacturing a semiconductor device
- Patent Title (中): 光掩模，将基板曝光的方法，形成图案的方法以及制造半导体器件的方法
-
Application No.: US12847274Application Date: 2010-07-30
-
Publication No.: US08304173B2Publication Date: 2012-11-06
- Inventor: Sang-Yong Yu , Sung-Hyuck Kim , Gi-Sung Yoon
- Applicant: Sang-Yong Yu , Sung-Hyuck Kim , Gi-Sung Yoon
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2009-0078533 20090825
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
The method of forming a pattern includes forming a first photosensitive layer pattern including a first pattern in a first region of a substrate and a second pattern in a second region of the substrate, by performing a first photolithography process using a photomask having a first mask region and a second mask region. The first pattern is transferred from the first mask region, and the second pattern is transferred from the second mask region. The method further includes forming a second photosensitive layer pattern including a third pattern in the second region of the substrate and a fourth pattern in the first region of the substrate, by performing a second photolithography process using the photomask. The third pattern is transferred from the first mask region, and the fourth pattern is transferred from the second mask region.
Public/Granted literature
Information query
IPC分类:
