Invention Grant
- Patent Title: Charged particle beam equipment and charged particle microscopy
- Patent Title (中): 带电粒子束设备和带电粒子显微镜
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Application No.: US12234096Application Date: 2008-09-19
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Publication No.: US08304722B2Publication Date: 2012-11-06
- Inventor: Hiromi Inada , Mitsugu Sato , Atsushi Takane
- Applicant: Hiromi Inada , Mitsugu Sato , Atsushi Takane
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-366607 20041217
- Main IPC: G01N23/00
- IPC: G01N23/00

Abstract:
On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
Public/Granted literature
- US20090084955A1 CHARGED PARTICLE BEAM EQUIPMENT AND CHARGED PARTICLE MICROSCOPY Public/Granted day:2009-04-02
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