Invention Grant
US08304837B2 Differentially recessed contacts for multi-gate transistor of SRAM cell 有权
SRAM单元的多栅极晶体管的差分凹陷触点

Differentially recessed contacts for multi-gate transistor of SRAM cell
Abstract:
A complementary metal-oxide-semiconductor static random access memory cell that includes a plurality of P-channel multi-gate transistors and a plurality of N-channel multi-gate transistors. Each transistor includes a gate electrode and source and drain regions separated by the at least one gate electrode. The SRAM cell further includes a plurality of contacts formed within the source and drain regions of at least one transistor. A plurality of contacts of at least one transistor are recessed a predetermined recess amount, wherein a resistance of the at least one transistor is varied based upon the predetermined recess amount.
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