Invention Grant
US08304837B2 Differentially recessed contacts for multi-gate transistor of SRAM cell
有权
SRAM单元的多栅极晶体管的差分凹陷触点
- Patent Title: Differentially recessed contacts for multi-gate transistor of SRAM cell
- Patent Title (中): SRAM单元的多栅极晶体管的差分凹陷触点
-
Application No.: US12816825Application Date: 2010-06-16
-
Publication No.: US08304837B2Publication Date: 2012-11-06
- Inventor: Josephine B. Chang , Leland Chang , Chung-Hsun Lin , Jeffrey W. Sleight
- Applicant: Josephine B. Chang , Leland Chang , Chung-Hsun Lin , Jeffrey W. Sleight
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Agent Vazken Alexanian
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
A complementary metal-oxide-semiconductor static random access memory cell that includes a plurality of P-channel multi-gate transistors and a plurality of N-channel multi-gate transistors. Each transistor includes a gate electrode and source and drain regions separated by the at least one gate electrode. The SRAM cell further includes a plurality of contacts formed within the source and drain regions of at least one transistor. A plurality of contacts of at least one transistor are recessed a predetermined recess amount, wherein a resistance of the at least one transistor is varied based upon the predetermined recess amount.
Public/Granted literature
- US20110309448A1 DIFFERENTIALLY RECESSED CONTACTS FOR MULTI-GATE TRANSISTOR OF SRAM CELL Public/Granted day:2011-12-22
Information query
IPC分类: