Invention Grant
- Patent Title: Method and apparatus for controlling multiple exposures
- Patent Title (中): 用于控制多次曝光的方法和装置
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Application No.: US12662438Application Date: 2010-04-16
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Publication No.: US08305487B2Publication Date: 2012-11-06
- Inventor: Joon-Hyuk Cha , Young Su Moon , Shi Hwa Lee
- Applicant: Joon-Hyuk Cha , Young Su Moon , Shi Hwa Lee
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: Staas & Halsey LLP
- Priority: KR10-2009-0100156 20091021
- Main IPC: G03B7/00
- IPC: G03B7/00

Abstract:
Provided is a multi-exposure controlling method and apparatus. An exposure control unit may set an initial exposure time based on a comparison result between a predetermined brightness confidence interval and an average high brightness that is calculated based on at least one current histogram. A comparison unit may compare the brightness confidence interval and an average low brightness that is calculated based on a subsequent histogram obtained by photographing a subject using the set initial exposure time. The exposure control unit may change the initial exposure time based on a comparison result of the comparison unit.
Public/Granted literature
- US20110090365A1 Method and apparatus for controlling multiple exposures Public/Granted day:2011-04-21
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