Invention Grant
US08305552B2 Exposure apparatus, exposure method, and method for producing device
有权
曝光装置，曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method for producing device
- Patent Title (中): 曝光装置，曝光方法和制造装置的方法
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Application No.: US11390178Application Date: 2006-03-28
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Publication No.: US08305552B2Publication Date: 2012-11-06
- Inventor: Hisashi Nishinaga , Ikuo Hikima , Mitsunori Toyoda
- Applicant: Hisashi Nishinaga , Ikuo Hikima , Mitsunori Toyoda
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-338420 20030929; JP2003-344938 20031002; JP2004-042931 20040219
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/58 ; G03B27/74
Abstract:
A part of exposure beam through a liquid(LQ) via a projection optical system(PL) enters a light-transmitting section(44), enters an optical member(41) without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
Public/Granted literature
- US20060170891A1 Exposure apparatus, exposure method, and method for producing device Public/Granted day:2006-08-03
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