Invention Grant
- Patent Title: Image processing system, mask fabrication method, and program
- Patent Title (中): 图像处理系统，掩模制作方法和程序
-
Application No.: US11718784Application Date: 2006-08-31
-
Publication No.: US08311332B2Publication Date: 2012-11-13
- Inventor: Hiroshi Abe
- Applicant: Hiroshi Abe
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: K&L Gates LLP
- Priority: JP2005-257857 20050906
- International Application: PCT/JP2006/017205 WO 20060831
- International Announcement: WO2007/029591 WO 20070315
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
An image processing system and a mask preparation method able to prepare a mask by simple processing and a program executed in such an image processing system are provided. To extract the edges of the image, strings of pixels corresponding to the contours of an object are extracted from the edge extracted image, and border lines for the masking are acquired based on an approximation line thereof.
Public/Granted literature
- US20090129635A1 IMAGE PROCESSING SYSTEM, MASK FABRICATION METHOD, AND PROGRAM Public/Granted day:2009-05-21
Information query
