Invention Grant
- Patent Title: Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
- Patent Title (中): 多层体，抗蚀剂图案形成方法，通过精细加工制造图案的方法和电子装置
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Application No.: US11050830Application Date: 2005-02-07
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Publication No.: US08313892B2Publication Date: 2012-11-20
- Inventor: Junichi Kon
- Applicant: Junichi Kon
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2004-171202 20040609; JP2004-337249 20041122
- Main IPC: G03C1/85
- IPC: G03C1/85 ; G03C1/00 ; G03F7/00
Abstract:
Technologies to form fine resist patterns consistently by solving the problem of poor patterning influenced by a resist-protecting film, are provided. A layer made of a resist (resist layer) is formed on a substrate, a resist-protecting film comprising an antistatic resin and a photo-acid generating agent is formed on the resist layer, and active-energy rays are selectively irradiated over the resist-protecting film, so that a resist pattern is formed by developing the resist.
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