Invention Grant
- Patent Title: Photopolymerizable functional radical-containing organosilicon compound and making method
- Patent Title (中): 含光聚合官能团的有机硅化合物及其制备方法
-
Application No.: US12656753Application Date: 2010-02-16
-
Publication No.: US08314264B2Publication Date: 2012-11-20
- Inventor: Kazuhiro Tsuchida , Yuji Yoshikawa
- Applicant: Kazuhiro Tsuchida , Yuji Yoshikawa
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2009-033804 20090217
- Main IPC: C07F7/10
- IPC: C07F7/10

Abstract:
An organosilicon compound is provided comprising an organic functional radical having a photopolymerizable double bond linked to a hydrolyzable radical-bonded silicon atom via a divalent organic radical containing a urea bond. Due to the inclusion of amide, urethane or urea bond structure and a photopolymerizable functional radical, the organosilicon compound has excellent compatibility with resins. The method is capable of preparing the organosilicon compound having a minimal chlorine content.
Public/Granted literature
- US20100210862A1 Photopolymerizable functional radical-containing organosilicon compound and making method Public/Granted day:2010-08-19
Information query