Invention Grant
- Patent Title: Die backside standoff structures for semiconductor devices
- Patent Title (中): 用于半导体器件的模具背面隔离结构
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Application No.: US12773552Application Date: 2010-05-04
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Publication No.: US08314473B2Publication Date: 2012-11-20
- Inventor: Michael Gruenhagen , Thomas P. Welch , Eric J. Woolsey
- Applicant: Michael Gruenhagen , Thomas P. Welch , Eric J. Woolsey
- Applicant Address: US CA San Jose
- Assignee: Fairchild Semiconductor Corporation
- Current Assignee: Fairchild Semiconductor Corporation
- Current Assignee Address: US CA San Jose
- Agency: Kirton McConkie, PC
- Agent Kenneth E. Horton
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
Standoff structures that can be used on the die backside of semiconductor devices and methods for making the same are described. The devices contain a silicon substrate with an integrated circuit on the front side of the substrate and a backmetal layer on the backside of the substrate. Standoff structures made of Cu of Ni are formed on the backmetal layer and are embedded in a Sn-containing layer that covers the backmetal layer and the standoff structures. The standoff structures can be isolated from each other so that they are not connected and can also be configured to substantially mirror indentations in the leadframe that is attached to the Sn-containing layer. Other embodiments are described.
Public/Granted literature
- US20110272792A1 DIE BACKSIDE STANDOFF STRUCTURES FOR SEMICONDUCTOR DEVICES Public/Granted day:2011-11-10
Information query
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