Invention Grant
- Patent Title: Multilayer capacitor and method of manufacturing same
- Patent Title (中): 多层电容器及其制造方法
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Application No.: US12629646Application Date: 2009-12-02
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Publication No.: US08315035B2Publication Date: 2012-11-20
- Inventor: Masaaki Togashi , Sunao Masuda , Hiroshi Abe
- Applicant: Masaaki Togashi , Sunao Masuda , Hiroshi Abe
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2009-017086 20090128
- Main IPC: H01G4/228
- IPC: H01G4/228 ; H01G2/20 ; H01G4/06

Abstract:
A multilayer capacitor which can prevent chattering noises from occurring and improve the packaging density and packaging yield, and a method of manufacturing a multilayer capacitor are provided. Even when an electrostrictive vibration is generated in this multilayer capacitor upon voltage application, a joint surface of a metal terminal can flex, so as to mitigate the electrostrictive vibration, thereby preventing chattering noises from occurring. The joint surface is formed with a cutout and thus can fully secure its flexibility. In this multilayer capacitor, a step formed by a terminal connecting surface, a substrate connecting surface, and the joint surface is positioned within an area overlapping a capacitor element body as seen in the laminating direction of dielectric layers. Therefore, solder fillets do not protrude out of the capacitor element body, whereby the packaging density on a mounting substrate K can be improved. The state of solder fillets is easy to see from the outside, and a connection yield can also be secured.
Public/Granted literature
- US20100188798A1 MULTILAYER CAPACITOR AND METHOD OF MANUFACTURING SAME Public/Granted day:2010-07-29
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