Invention Grant
- Patent Title: Coil apparatus
- Patent Title (中): 线圈装置
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Application No.: US13387325Application Date: 2010-01-13
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Publication No.: US08319595B2Publication Date: 2012-11-27
- Inventor: Kimiaki Iwaya
- Applicant: Kimiaki Iwaya
- Applicant Address: JP Hokkaido
- Assignee: Cosmo Mechanics Co., Ltd.
- Current Assignee: Cosmo Mechanics Co., Ltd.
- Current Assignee Address: JP Hokkaido
- Agency: Notaro, Michalos & Zaccaria P.C.
- International Application: PCT/JP2010/000145 WO 20100113
- International Announcement: WO2011/086596 WO 20110721
- Main IPC: H01F5/00
- IPC: H01F5/00

Abstract:
Disc-type coil lamination work is facilitated, and a manufacturing cost is reduced. A plurality of disc-type coils each including a discoid insulating substrate 1, conductor patterns 2 arranged on the insulating substrate 1, and holes 7 configured to form lamination through holes 10 bored in the insulating substrate 1 are laminated by connecting the lamination through holes 10. The holes 7 configured to form the lamination through holes 10 are provided on the outer circumferential side or the inner circumferential side of the conductor patterns 2, and a leading pattern 3 and a terminating pattern 4 serving as terminal portions of each conductor pattern 2 are drawn to the holes 7 and connected, thereby forming the lamination through holes 10.
Public/Granted literature
- US20120126927A1 COIL APPARATUS Public/Granted day:2012-05-24
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