Invention Grant
- Patent Title: Exposure apparatus, light source apparatus and method of manufacturing device
- Patent Title (中): 曝光装置，光源装置及其制造方法
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Application No.: US12642726Application Date: 2009-12-18
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Publication No.: US08319943B2Publication Date: 2012-11-27
- Inventor: Hiroshi Tanaka
- Applicant: Hiroshi Tanaka
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2008-335220 20081226
- Main IPC: G03B27/42
- IPC: G03B27/42
Abstract:
An apparatus exposes a substrate via a pattern of a reticle using pulsed light generated by a light source, and includes a controller configured to control the light source so that the oscillation frequency of the light source changes periodically while the apparatus exposes the substrate. The oscillation frequency is the number of times of emission of the light source per unit time.
Public/Granted literature
- US20100166030A1 EXPOSURE APPARATUS, LIGHT SOURCE APPARATUS AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2010-07-01
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