Invention Grant
- Patent Title: Device and method for beam adjustment in an optical beam path
- Patent Title (中): 光束路径中光束调整的装置和方法
-
Application No.: US12073360Application Date: 2008-03-04
-
Publication No.: US08319970B2Publication Date: 2012-11-27
- Inventor: Holger Birk , Marcus Dyba , Hilmar Gugel , Volker Seyfried
- Applicant: Holger Birk , Marcus Dyba , Hilmar Gugel , Volker Seyfried
- Applicant Address: DE Wetzlar
- Assignee: Leica Microsystems CMS GmbH
- Current Assignee: Leica Microsystems CMS GmbH
- Current Assignee Address: DE Wetzlar
- Agency: Foley & Lardner LLP
- Priority: DE102007011305 20070306
- Main IPC: G01N21/55
- IPC: G01N21/55

Abstract:
A device for beam adjustment in an optical beam path, having at least two mutually independent light sources providing respective beams of a high or extremely high resolution microscope, the beams of the light sources superposed in a common illumination beam path. The device includes a calibration sample with the aid of which the pupil position and/or focal position of the beams can be checked. The device also includes a sample holder arranged to bring the calibration sample into and out of the common illumination beam path at the site or in the vicinity of an intermediate image. A corresponding method is described. In accordance with the device and method, it is possible to undertake the beam adjustment independently of the actual use, that is to say, in the case of a high resolution microscope, independently of the examination sample and/or the recording of images.
Public/Granted literature
- US20080316469A1 Device and method for beam adjustment in an optical beam path Public/Granted day:2008-12-25
Information query