Invention Grant
- Patent Title: Defect reduction in seeded aluminum nitride crystal growth
- Patent Title (中): 接种氮化铝晶体生长的缺陷减少
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Application No.: US12015957Application Date: 2008-01-17
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Publication No.: US08323406B2Publication Date: 2012-12-04
- Inventor: Robert T. Bondokov , Kenneth E. Morgan , Leo J. Schowalter , Glen A. Slack
- Applicant: Robert T. Bondokov , Kenneth E. Morgan , Leo J. Schowalter , Glen A. Slack
- Applicant Address: US NY Green Island
- Assignee: Crystal IS, Inc.
- Current Assignee: Crystal IS, Inc.
- Current Assignee Address: US NY Green Island
- Agency: Bingham McCutchen LLP
- Main IPC: C30B25/14
- IPC: C30B25/14

Abstract:
Bulk single crystal of aluminum nitride (AlN) having an a real planar defect density≦100 cm−2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum, the foundation forming a portion of an AlN seed holder, for an AlN seed to be used for the AlN growth. The holder may consist essentially of a substantially impervious backing plate.
Public/Granted literature
- US20080182092A1 DEFECT REDUCTION IN SEEDED ALUMINUM NITRIDE CRYSTAL GROWTH Public/Granted day:2008-07-31
Information query
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