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US08323406B2 Defect reduction in seeded aluminum nitride crystal growth 有权
接种氮化铝晶体生长的缺陷减少

Defect reduction in seeded aluminum nitride crystal growth
Abstract:
Bulk single crystal of aluminum nitride (AlN) having an a real planar defect density≦100 cm−2. Methods for growing single crystal aluminum nitride include melting an aluminum foil to uniformly wet a foundation with a layer of aluminum, the foundation forming a portion of an AlN seed holder, for an AlN seed to be used for the AlN growth. The holder may consist essentially of a substantially impervious backing plate.
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