Invention Grant
- Patent Title: Methods of forming metal-containing structures, and methods of forming germanium-containing structures
- Patent Title (中): 形成含金属结构的方法,以及形成含锗结构的方法
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Application No.: US13426926Application Date: 2012-03-22
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Publication No.: US08323736B2Publication Date: 2012-12-04
- Inventor: Timothy A. Quick , Eugene P. Marsh
- Applicant: Timothy A. Quick , Eugene P. Marsh
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/06 ; C23C16/18

Abstract:
Some embodiments include methods of forming metal-containing structures. A first metal-containing material may be formed over a substrate. After the first metal-containing material is formed, and while the substrate is within a reaction chamber, hydrogen-containing reactant may be used to form a hydrogen-containing layer over the first metal-containing material. The hydrogen-containing reactant may be, for example, formic acid and/or formaldehyde. Any unreacted hydrogen-containing reactant may be purged from within the reaction chamber, and then metal-containing precursor may be flowed into the reaction chamber. The hydrogen-containing layer may be used during conversion of the metal-containing precursor into a second metal-containing material that forms directly against the first metal-containing material. Some embodiments include methods of forming germanium-containing structures, such as, for example, methods of forming phase change materials containing germanium, antimony and tellurium.
Public/Granted literature
- US20120178209A1 Methods Of Forming Metal-Containing Structures, And Methods Of Forming Germanium-Containing Structures Public/Granted day:2012-07-12
Information query
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