Invention Grant
US08323868B2 Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof
有权
双层体系包括聚二甲基戊二酰亚胺基底层及其组合物
- Patent Title: Bilayer systems including a polydimethylglutarimide-based bottom layer and compositions thereof
- Patent Title (中): 双层体系包括聚二甲基戊二酰亚胺基底层及其组合物
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Application No.: US12613800Application Date: 2009-11-06
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Publication No.: US08323868B2Publication Date: 2012-12-04
- Inventor: Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Hoa D. Truong
- Applicant: Joy Cheng , Ho-Cheol Kim , Hiroshi Ito , Atsuko Ito, legal representative , Hoa D. Truong
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004 ; G03F7/028 ; G03F7/11
Abstract:
Bilayer systems include a bottom layer formed of polydimethylglutarimide, an acid labile dissolution inhibitor and a photoacid generator. The bilayer system can be exposed and developed in a single exposure and development process.
Public/Granted literature
- US20110111339A1 BILAYER SYSTEMS INCLUDING A POLYDIMETHYLGLUTARIMIDE-BASED BOTTOM LAYER AND COMPOSITIONS THEREOF Public/Granted day:2011-05-12
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