Invention Grant
US08324708B2 Semiconductor integrated circuit device and manufacturing method thereof 有权
半导体集成电路器件及其制造方法

Semiconductor integrated circuit device and manufacturing method thereof
Abstract:
Provided is a semiconductor integrated circuit device including fuse elements for carrying out laser trimming processing, in which a space width between aluminum interconnects of the first layer to be connected to the adjacent fuse elements is set to less than twice of the thickness of the side wall of the metal interlayer insulating film of the first layer, thereby preventing exposure of the SOG layer having hygroscopic property. In addition, side spacers are provided to side surfaces of the aluminum interconnects of the first layer.
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