Invention Grant
- Patent Title: Semiconductor integrated circuit device and manufacturing method thereof
- Patent Title (中): 半导体集成电路器件及其制造方法
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Application No.: US12888183Application Date: 2010-09-22
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Publication No.: US08324708B2Publication Date: 2012-12-04
- Inventor: Yukimasa Minami , Masaru Akino
- Applicant: Yukimasa Minami , Masaru Akino
- Applicant Address: JP Chiba
- Assignee: Seiko Instruments Inc.
- Current Assignee: Seiko Instruments Inc.
- Current Assignee Address: JP Chiba
- Agency: Brinks Hofer Gilson & Lione
- Priority: JP2009-221238 20090925
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
Provided is a semiconductor integrated circuit device including fuse elements for carrying out laser trimming processing, in which a space width between aluminum interconnects of the first layer to be connected to the adjacent fuse elements is set to less than twice of the thickness of the side wall of the metal interlayer insulating film of the first layer, thereby preventing exposure of the SOG layer having hygroscopic property. In addition, side spacers are provided to side surfaces of the aluminum interconnects of the first layer.
Public/Granted literature
- US20110073986A1 SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-03-31
Information query
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