Invention Grant
- Patent Title: Memristors with an electrode metal reservoir for dopants
- Patent Title (中): 具有用于掺杂剂的电极金属储存器的忆阻器
-
Application No.: US12893825Application Date: 2010-09-29
-
Publication No.: US08325507B2Publication Date: 2012-12-04
- Inventor: Jianhua Yang , Wei Yi , Michael Josef Stuke , Shih-Yuan Wang
- Applicant: Jianhua Yang , Wei Yi , Michael Josef Stuke , Shih-Yuan Wang
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Agent David W. Collins
- Main IPC: H01L29/8605
- IPC: H01L29/8605 ; H01L21/04 ; G11C11/21

Abstract:
A memristor includes a first electrode of a nanoscale width; a second electrode of a nanoscale width; and an active region disposed between the first and second electrodes. The active region has a both a non-conducting portion and a source of dopants portion induced by electric field. The non-conducting portion comprises an electronically semiconducting or nominally insulating material and a weak ionic conductor switching material capable of carrying a species of dopants and transporting the dopants under an electric field. The non-conducting portion is in contact with the first electrode and the source of dopants portion is in contact with the second electrode. The second electrode comprises a metal reservoir for the dopants. A crossbar array comprising a plurality of the nanoscale switching devices is also provided. A process for making at least one nanoscale switching device is further provided.
Public/Granted literature
- US20120074372A1 MEMRISTORS WITH AN ELECTRODE METAL RESERVOIR FOR DOPANTS Public/Granted day:2012-03-29
Information query
IPC分类: