Invention Grant
US08331178B2 Memory device capable of operation in a burn in stress mode, method for performing burn in stress on a memory device, and method for detecting leakage current of a memory device
有权
能够在应力模式下烧伤的存储装置,在存储装置上进行应力烧伤的方法,以及检测存储装置的漏电流的方法
- Patent Title: Memory device capable of operation in a burn in stress mode, method for performing burn in stress on a memory device, and method for detecting leakage current of a memory device
- Patent Title (中): 能够在应力模式下烧伤的存储装置,在存储装置上进行应力烧伤的方法,以及检测存储装置的漏电流的方法
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Application No.: US13303172Application Date: 2011-11-23
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Publication No.: US08331178B2Publication Date: 2012-12-11
- Inventor: Shi-Huei Liu , Tzu-Hao Chen , Te-Yi Yu , Ming-Hong Kuo
- Applicant: Shi-Huei Liu , Tzu-Hao Chen , Te-Yi Yu , Ming-Hong Kuo
- Applicant Address: TW Hsinchu
- Assignee: Etron Technology, Inc.
- Current Assignee: Etron Technology, Inc.
- Current Assignee Address: TW Hsinchu
- Agent Winston Hsu; Scott Margo
- Priority: TW99145750A 20101224
- Main IPC: G11C29/00
- IPC: G11C29/00

Abstract:
Activate one active word line of two active word lines formed between two isolation word lines to a logic-high voltage, and float another active word line of the two active word lines. Then activate a plurality of first memory cells corresponding to the active word line having the logic-high voltage to a logic “1” voltage, and write a logic “0” voltage to a plurality of second memory cells corresponding to the floating active word line. Then write the logic “1” voltage to a plurality of bit lines. Then, suspend for charge sharing for a third predetermined time. Finally, read a voltage of the floating active word line to check if any leakage path exists between the floating active word line and the active word line having the logic-high voltage.
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