Invention Grant
- Patent Title: System and method for exposure management
- Patent Title (中): 暴露管理系统和方法
-
Application No.: US12199775Application Date: 2008-08-27
-
Publication No.: US08332298B2Publication Date: 2012-12-11
- Inventor: Klaus Mueller , Reinhold Loevenich , Vinodh A R , Pankaj Jain
- Applicant: Klaus Mueller , Reinhold Loevenich , Vinodh A R , Pankaj Jain
- Applicant Address: DE Walldorf
- Assignee: SAP AG
- Current Assignee: SAP AG
- Current Assignee Address: DE Walldorf
- Agency: Kenyon & Kenyon LLP
- Main IPC: G06Q40/00
- IPC: G06Q40/00

Abstract:
A system, method, and computer-readable medium having instructions stored thereon to implement a method for risk exposure management allowing an exposure record to influence one or more risk exposures. In an embodiment, an exposure record is received, at least one data element of the received exposure record being mapped to one or more subexposures. At least one of the one or more subexposures are mapped to one of one or more exposure positions, wherein each exposure position corresponds to exactly one of the one or more risk exposures.
Public/Granted literature
- US20090313175A1 SYSTEM AND METHOD FOR EXPOSURE MANAGEMENT Public/Granted day:2009-12-17
Information query