Invention Grant
- Patent Title: High-purity aqueous copper sulfonate solution and method of producing same
- Patent Title (中): 高纯度磺酸铜水溶液及其制备方法
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Application No.: US13497551Application Date: 2011-02-09
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Publication No.: US08333834B2Publication Date: 2012-12-18
- Inventor: Junnosuke Sekiguchi , Masaomi Murakami , Toru Imori
- Applicant: Junnosuke Sekiguchi , Masaomi Murakami , Toru Imori
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Flynn, Thiel, Boutell & Tanis, P.C.
- Priority: JP2010-035972 20100222
- International Application: PCT/JP2011/052749 WO 20110209
- International Announcement: WO2011/102276 WO 20110825
- Main IPC: C01G3/00
- IPC: C01G3/00 ; C25D3/38

Abstract:
An object of the present invention is to provide a high-purity aqueous copper sulfonate solution and a simplified method of producing this solution.The aqueous copper sulfonate solution of the present invention is characterized in that the copper concentration therein is at least 90 g/L, the content of metal impurities is less than 10 mg/L as metal for each metal impurity, the content of chlorine is less than 10 mg/L, and the sulfonic acid is a sulfonic acid represented by the following general formula R—(SO3H)n (in the formula, R represents a lower alkyl group, lower alkylidene group, lower alkylene group, or hydroxyalkyl group and n represents 1 or 2).
Public/Granted literature
- US20120174827A1 HIGH-PURITY AQUEOUS COPPER SULFONATE SOLUTION AND METHOD OF PRODUCING SAME Public/Granted day:2012-07-12
Information query
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