Invention Grant
- Patent Title: Polishing apparatus and method of polishing work
- Patent Title (中): 抛光设备和抛光工作方法
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Application No.: US11598789Application Date: 2006-11-14
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Publication No.: US08333882B2Publication Date: 2012-12-18
- Inventor: Unkai Sato , Koichiro Ichikawa , Yoshinobu Nishimoto , Yoshio Nakamura , Tsuyoshi Hasegawa , Masumi Iihama
- Applicant: Unkai Sato , Koichiro Ichikawa , Yoshinobu Nishimoto , Yoshio Nakamura , Tsuyoshi Hasegawa , Masumi Iihama
- Applicant Address: JP Nagano
- Assignee: Fujikoshi Machinery Corp.
- Current Assignee: Fujikoshi Machinery Corp.
- Current Assignee Address: JP Nagano
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2005-330362 20051115; JP2006-280840 20061016
- Main IPC: C25F3/30
- IPC: C25F3/30

Abstract:
The method of polishing a work is capable of reducing a polishing cost, polishing a surface of the work with high polishing accuracy and easily disposing used polishing liquid and used washing liquid. The method comprises the steps of: pressing the work onto a polishing member; feeding polishing liquid; and relatively moving the work with respect to the polishing member. Electrolytic reduced water produced by electrolyzing an electrolyte solution is used as the polishing liquid.
Public/Granted literature
- US20070108067A1 Polishing apparatus and method of polishing work Public/Granted day:2007-05-17
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